INTERNATIONAL PATENT: TOSOH SILICA CORPORATION, 東ソー・シリカ株式会社 FILES APPLICATION FOR "PRECIPITATED SILICA HAVING LOW BET SPECIFIC SURFACE AREA, COMPOSITION INCLUDING SAME AND METHOD FOR PRODUCING PRECIPITATED SILICA"

GENEVA, Dec. 16 -- TOSOH SILICA CORPORATION (4560, Kaisei-cho, Shunan-shi, Yamaguchi7460006), 東ソー・シリカ株式会社 (山口県周南市開成町４５６０番地) filed a patent application (PCT/JP2025/019331) for "PRECIPITATED SILICA HAVING LOW BET SPECIFIC SURFACE AREA, COMPOSITION INCLUDING SAME, AND METHOD FOR PRODUCING PRECIPITATED SILICA" on May 28, 2025. With publication no. WO/2025/254001, the details related to the patent application was published on Dec 11, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by th...