GENEVA, Sept. 9 -- TOSOH CORPORATION (4560, Kaisei-cho, Shunan-shi, Yamaguchi7468501), 東ソー株式会社 (山口県周南市開成町４５６０番地) filed a patent application (PCT/JP2025/006567) for "CR-SI-N SINTERED COMPACT, PRODUCTION METHOD THEREFOR, SPUTTERING TARGET, AND PRODUCTION METHOD FOR NITROGEN-CONTAINING CHROMIUM SILICIDE FILM" on Feb 26, 2025. With publication no. WO/2025/182969, the details related to the patent application was published on Sep 04, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Propert...