GENEVA, April 1 -- TORAY INDUSTRIES, INC. (1-1, Nihonbashi-Muromachi 2-chome, Chuo-ku, Tokyo1038666), 東レ株式会社 (東京都中央区日本橋室町２丁目１番１号) filed a patent application (PCT/JP2024/031656) for "NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT USING SAME" on Sep 04, 2024. With publication no. WO/2025/063041, the details related to the patent application was published on Mar 27, 2025.
Notably, the patent application was submitted under the International Pa...