GENEVA, Oct. 5 -- TOMOEGAWA CORPORATION (2-1-3, Kyobashi, Chuo-ku, Tokyo1048335), 株式会社巴川コーポレーション (東京都中央区京橋二丁目1番3号) filed a patent application (PCT/JP2025/012288) for "MASK COMPOSITION AND MASK FOR ETCHING" on Mar 27, 2025. With publication no. WO/2025/206081, the details related to the patent application was published on Oct 02, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KATOU Masao (c/o...