GENEVA, May 13 -- TOKYO OHKA KOGYO CO., LTD. (150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa2110012), 東京応化工業株式会社 (神奈川県川崎市中原区中丸子１５０番地) filed a patent application (PCT/JP2024/037748) for "NEGATIVE PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RESIST FILM, METHOD FOR PRODUCING HOLLOW STRUCTURE, AND PATTERN FORMING METHOD" on Oct 23, 2024. With publication no. WO/2025/094787, the details related to the patent application was published on May 08, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) ...