INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE"

GENEVA, April 28 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東京都港区赤坂五丁目３番１号) filed a patent application (PCT/JP2024/035716) for "SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE" on Oct 07, 2024. With publication no. WO/2025/084172, the details related to the patent application was published on Apr 24, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): YAMADA, Ka...