INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "SUBSTRATE TREATMENT APPARATUS, SUBSTRATE TREATMENT METHOD AND COMPUTER-READABLE RECORDING MEDIUM"

GENEVA, May 19 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東京都港区赤坂五丁目３番１号) filed a patent application (PCT/JP2024/038312) for "SUBSTRATE TREATMENT APPARATUS, SUBSTRATE TREATMENT METHOD, AND COMPUTER-READABLE RECORDING MEDIUM" on Oct 28, 2024. With publication no. WO/2025/100285, the details related to the patent application was published on May 15, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organiz...