INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "FILM FORMING METHOD AND PLASMA PROCESSING APPARATUS"

GENEVA, March 10 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東京都港区赤坂五丁目３番１号) filed a patent application (PCT/JP2024/029017) for "FILM FORMING METHOD AND PLASMA PROCESSING APPARATUS" on Aug 15, 2024. With publication no. WO/2025/047433, the details related to the patent application was published on Mar 06, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KANEKO, Miyako (...