INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "FILM FORMING DEVICE, FILM FORMING METHOD AND SUBSTRATE PROCESSING METHOD"

GENEVA, Aug. 18 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東京都港区赤坂五丁目３番１号) filed a patent application (PCT/JP2025/002356) for "FILM FORMING DEVICE, FILM FORMING METHOD, AND SUBSTRATE PROCESSING METHOD" on Jan 27, 2025. With publication no. WO/2025/169766, the details related to the patent application was published on Aug 14, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor...