INTERNATIONAL PATENT: TOKUYAMA DENTAL CORPORATION, 株式会社トクヤマデンタル FILES APPLICATION FOR "AMORPHOUS SILICA-BASED COMPOSITE OXIDE PARTICULATES, METHOD FOR PRODUCING SAME, DENTAL COMPOSITION AND BLANK FOR DENTAL CUTTING"

GENEVA, June 3 -- TOKUYAMA DENTAL CORPORATION (38-9, Taito 1-chome, Taito-ku, Tokyo1100016), 株式会社トクヤマデンタル (東京都台東区台東１丁目３８番９号) filed a patent application (PCT/JP2024/040680) for "AMORPHOUS SILICA-BASED COMPOSITE OXIDE PARTICULATES, METHOD FOR PRODUCING SAME, DENTAL COMPOSITION, AND BLANK FOR DENTAL CUTTING" on Nov 15, 2024. With publication no. WO/2025/110108, the details related to the patent application was published on May 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is ...