GENEVA, March 17 -- TOKUYAMA CORPORATION (1-1, Mikage-cho, Shunan-shi, Yamaguchi7458648), 株式会社トクヤマ (山口県周南市御影町１番１号) filed a patent application (PCT/JP2024/030986) for "SILICON NITRIDE SUBSTRATE" on Aug 29, 2024. With publication no. WO/2025/053045, the details related to the patent application was published on Mar 13, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): KUSANO, Dai (c/o Tokuyama Corporation, 1-1, Mikage-cho, Shunan-shi, Yamaguchi7458648...