GENEVA, March 10 -- TOKUYAMA CORPORATION (1-1, Mikage-cho, Shunan-shi, Yamaguchi7458648), 株式会社トクヤマ (山口県周南市御影町１番１号) filed a patent application (PCT/JP2024/030324) for "SILICON NITRIDE SUBSTRATE" on Aug 26, 2024. With publication no. WO/2025/047685, the details related to the patent application was published on Mar 06, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): KUSANO, Dai (c/o Tokuyama Corporation, 1-1, Mikage-cho, Shunan-shi, Yamaguchi7458648...