INTERNATIONAL PATENT: TOKUYAMA CORPORATION, 株式会社トクヤマ FILES APPLICATION FOR "POROUS SPHERICAL SILICA AND METHOD FOR PRODUCING SAME"

GENEVA, March 25 -- TOKUYAMA CORPORATION (1-1, Mikage-cho, Shunan-shi, Yamaguchi7458648), 株式会社トクヤマ (山口県周南市御影町１番１号) filed a patent application (PCT/JP2024/031711) for "POROUS SPHERICAL SILICA AND METHOD FOR PRODUCING SAME" on Sep 04, 2024. With publication no. WO/2025/057834, the details related to the patent application was published on Mar 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): YOSHIMURA, Noriko (c/o TOKUYAMA CORPORATION, 1-1, Mikage...