GENEVA, Aug. 5 -- THE NISSHIN OILLIO GROUP, LTD. (23-1, Shinkawa 1-chome, Chuo-ku, Tokyo1048285), 日清オイリオグループ株式会社 (東京都中央区新川一丁目23番1号) filed a patent application (PCT/JP2025/002051) for "SILICON OXIDE VAPOR-DEPOSITED FILM AND MOLDED ARTICLE INCLUDING SAME" on Jan 23, 2025. With publication no. WO/2025/159157, the details related to the patent application was published on Jul 31, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Prope...