INTERNATIONAL PATENT: THE HONG KONG RESEARCH INSTITUTE OF TEXTILES AND APPAREL LIMITED FILES APPLICATION FOR "A TREATMENT METHOD FOR INDIGO-CONTAINING WASTEWATER BY COMBINED ADSORPTION AND REGENERATION PROCESS"

GENEVA, March 9 -- THE HONG KONG RESEARCH INSTITUTE OF TEXTILES AND APPAREL LIMITED (R906, Shirley Chan Building, The Hong Kong Polytechnic UniversityKowloon, Hong Kong) filed a patent application (PCT/IB2023/058860) for "A TREATMENT METHOD FOR INDIGO-CONTAINING WASTEWATER BY COMBINED ADSORPTION AND REGENERATION PROCESS" on Sep 07, 2023. With publication no. WO/2025/046276, the details related to the patent application was published on Mar 06, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): CHAN, Alex (c/o The Hong Kong Research Institute of Textiles and Apparel, R906, Shirley Chan BuildingK...