INTERNATIONAL PATENT: TEKSCEND PHOTOMASK CORP., テクセンドフォトマスク株式会社 FILES APPLICATION FOR "REFLECTIVE PHOTOMASK BLANK, REFLECTIVE PHOTOMASK AND REFLECTIVE PHOTOMASK PRODUCTION METHOD"

GENEVA, Sept. 9 -- TEKSCEND PHOTOMASK CORP. (1-5-2, Higashi-Shimbashi, Minato-ku, Tokyo1057133), テクセンドフォトマスク株式会社 (東京都港区東新橋１丁目５番２号) filed a patent application (PCT/JP2025/005942) for "REFLECTIVE PHOTOMASK BLANK, REFLECTIVE PHOTOMASK, AND REFLECTIVE PHOTOMASK PRODUCTION METHOD" on Feb 20, 2025. With publication no. WO/2025/182786, the details related to the patent application was published on Sep 04, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the W...