GENEVA, Oct. 19 -- TEKSCEND PHOTOMASK CORP. (1-5-2, Higashi-Shimbashi, Minato-ku, Tokyo1057133), テクセンドフォトマスク株式会社 (東京都港区東新橋１丁目５番２号) filed a patent application (PCT/JP2025/013275) for "REFLECTIVE PHOTOMASK BLANK, REFLECTIVE PHOTOMASK, AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK" on Mar 31, 2025. With publication no. WO/2025/216118, the details related to the patent application was published on Oct 16, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed b...