INTERNATIONAL PATENT: TEKSCEND PHOTOMASK CORP., テクセンドフォトマスク株式会社 FILES APPLICATION FOR "REFLECTIVE MASK BLANK AND REFLECTIVE MASK"

GENEVA, April 20 -- TEKSCEND PHOTOMASK CORP. (1-5-2, Higashi-Shimbashi, Minato-ku, Tokyo1057133), テクセンドフォトマスク株式会社 (東京都港区東新橋１丁目５番２号) filed a patent application (PCT/JP2024/036448) for "REFLECTIVE MASK BLANK AND REFLECTIVE MASK" on Oct 11, 2024. With publication no. WO/2025/079684, the details related to the patent application was published on Apr 17, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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