GENEVA, June 24 -- TEKSCEND PHOTOMASK CORP. (1-5-2, Higashi-Shimbashi, Minato-ku, Tokyo1057133), テクセンドフォトマスク株式会社 (東京都港区東新橋１丁目５番２号) filed a patent application (PCT/JP2024/043408) for "REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK" on Dec 09, 2024. With publication no. WO/2025/127000, the details related to the patent application was published on Jun 19, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Int...