INTERNATIONAL PATENT: TEKSCEND PHOTOMASK CORP., テクセンドフォトマスク株式会社 FILES APPLICATION FOR "PHOTOMASK AND METHOD FOR INSPECTING SAME"

GENEVA, Feb. 17 -- TEKSCEND PHOTOMASK CORP. (1-5-2, Higashi-Shimbashi, Minato-ku, Tokyo1057133), テクセンドフォトマスク株式会社 (東京都港区東新橋１丁目５番２号) filed a patent application (PCT/JP2024/024949) for "PHOTOMASK AND METHOD FOR INSPECTING SAME" on Jul 10, 2024. With publication no. WO/2025/033085, the details related to the patent application was published on Feb 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inv...