INTERNATIONAL PATENT: TCL ZHONGHUAN RENEWABLE ENERGY TECHNOLOGY CO., LTD., TCL中环新能源科技股份有限公司 FILES APPLICATION FOR "SILICON WAFER WATER ABSORPTION PLATE INSERT CLEANING MECHANISM"

Posted On: 2025-06-01

GENEVA, June 1 -- TCL ZHONGHUAN RENEWABLE ENERGY TECHNOLOGY CO., LTD. (No.12, East Haitai Road, Huayuan Industrial Park (Outer Ring), Tianjin New Technology Industrial ParkBinhai New Area, Tianjin 300384), TCL中环新能源科技股份有限公司 (中国天津市滨海新区天津新技术产业园区华苑产业区（环外）海泰东路12号) filed a patent application (PCT/CN2024/100245) for "SILICON WAFER WATER ABSORPTION PLATE INSERT CLEANING MECHANISM" on Jun 20, 2024. With publication no. WO/2025/107606, the d...

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INTERNATIONAL PATENT: TCL ZHONGHUAN RENEWABLE ENERGY TECHNOLOGY CO., LTD., TCL中环新能源科技股份有限公司 FILES APPLICATION FOR "SILICON WAFER WATER ABSORPTION PLATE INSERT CLEANING MECHANISM"