INTERNATIONAL PATENT: TASMIT, INC., 東レエンジニアリング先端半導体ＭＩテクノロジー株式会社 FILES APPLICATION FOR "PATTERN MEASURING METHOD AND PATTERN MEASURING DEVICE"

GENEVA, Sept. 30 -- TASMIT, INC. (2-6-23, Shin-Yokohama, Kohoku-ku, Yokohama-shi, Kanagawa2220033), 東レエンジニアリング先端半導体ＭＩテクノロジー株式会社 (神奈川県横浜市港北区新横浜二丁目６番２３号) filed a patent application (PCT/JP2025/008245) for "PATTERN MEASURING METHOD AND PATTERN MEASURING DEVICE" on Mar 06, 2025. With publication no. WO/2025/197587, the details related to the patent application was published on Sep 25, 2025.

Notably, the patent app...