INTERNATIONAL PATENT: SOULBRAIN CO., LTD., 솔브레인 주식회사 FILES APPLICATION FOR "ULTRATHIN FILM, METHOD FOR FORMING ULTRA-THIN FILM AND SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR DEVICE MANUFACTURED THEREFROM"

GENEVA, May 13 -- SOULBRAIN CO., LTD. (34, Pangyo-ro 255beon-gil, Bundang-gu,Seongnam-si,Gyeonggi-do 13486), 솔브레인 주식회사 (경기도성남시분당구 판교로255번길 34) filed a patent application (PCT/KR2024/016872) for "ULTRATHIN FILM, METHOD FOR FORMING ULTRA-THIN FILM, AND SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR DEVICE MANUFACTURED THEREFROM" on Oct 31, 2024. With publication no. WO/2025/095603, the details related to the patent application was published on May 08, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Inte...