INTERNATIONAL PATENT: SK TRI CHEM CO., LTD., 에스케이트리켐 주식회사, SK HYNIX INC., 에스케이하이닉스 주식회사 FILES APPLICATION FOR "PRECURSOR FOR FORMING LOW-K THIN FILM AND METHOD FOR FORMING LOW-K SILICON-CONTAINING THIN FILM USING SAME"

Posted On: 2025-02-04

GENEVA, Feb. 4 -- SK TRI CHEM CO., LTD. (110-5, Myeonghaksandan-ro, Yeondong-myeonSejong 30068), 에스케이트리켐 주식회사 (세종특별자치시연동면 명학산단로 110-5), SK HYNIX INC. (2091, Gyeongchung-daero, Bubal-eupIcheon-siGyeonggi-do 17336), 에스케이하이닉스 주식회사 (경기도이천시부발읍 경충대로 2091) filed a patent application (PCT/KR2024/007671) for "PRECURSOR FOR FORMING LOW-K THIN FILM AND METHOD FOR FORMING LOW-K SILICON-CONTAINING THIN ...

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INTERNATIONAL PATENT: SK TRI CHEM CO., LTD., 에스케이트리켐 주식회사, SK HYNIX INC., 에스케이하이닉스 주식회사 FILES APPLICATION FOR "PRECURSOR FOR FORMING LOW-K THIN FILM AND METHOD FOR FORMING LOW-K SILICON-CONTAINING THIN FILM USING SAME"