INTERNATIONAL PATENT: SK TRI CHEM CO., LTD., 에스케이트리켐 주식회사, SK HYNIX INC., 에스케이하이닉스 주식회사 FILES APPLICATION FOR "PRECURSOR FOR FORMING LOW-DIELECTRIC CONSTANT SILICON-CONTAINING THIN FILM AND METHOD FOR FORMING LOW-DIELECTRIC CONSTANT SILICON-CONTAINING THIN FILM BY USING SAME"

GENEVA, Oct. 5 -- SK TRI CHEM CO., LTD. (110-5, Myeonghaksandan-ro, Yeondong-myeon, Sejong-si30068), 에스케이트리켐 주식회사 (세종특별자치시연동면 명학산단로 110-5), SK HYNIX INC. (2091 Gyeongchung-daero, Bubal-eupIcheon-siGyeonggi-do 17336), 에스케이하이닉스 주식회사 (경기도이천시부발읍 경충대로 2091) filed a patent application (PCT/KR2025/095078) for "PRECURSOR FOR FORMING LOW-DIELECTRIC CONSTANT SILICON-CONTAINING THIN FILM AND METHOD FO...