INTERNATIONAL PATENT: SK SPECIALTY CO., LTD., 에스케이스페셜티 주식회사 FILES APPLICATION FOR "DEPOSITION METHOD OF SILICON OXIDE FILM ON SEMICONDUCTOR SUBSTRATE AND PREPARATION METHOD OF SEMICONDUCTOR DEVICE COMPRISING SAME"

GENEVA, July 3 -- SK SPECIALTY CO., LTD. (63, Gaheunggongdan-roYeongju-siGyeongsangbuk-do 36059), 에스케이스페셜티 주식회사 (경상북도영주시가흥공단로 63) filed a patent application (PCT/KR2024/015781) for "DEPOSITION METHOD OF SILICON OXIDE FILM ON SEMICONDUCTOR SUBSTRATE, AND PREPARATION METHOD OF SEMICONDUCTOR DEVICE COMPRISING SAME" on Oct 17, 2024. With publication no. WO/2025/135433, the details related to the patent application was published on Jun 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World ...