INTERNATIONAL PATENT: SHENZHEN INSTITUTE OF ADVANCED ELECTRONIC MATERIALS, 深圳先进电子材料国际创新研究院 FILES APPLICATION FOR "PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION AND PREPARATION METHOD THEREFOR AND USE THEREOF"

GENEVA, July 7 -- SHENZHEN INSTITUTE OF ADVANCED ELECTRONIC MATERIALS (Longwangmiao Industrial Zone, Fuyong Street, Bao'an DistrictShenzhen, Guangdong 518103), 深圳先进电子材料国际创新研究院 (中国广东省深圳市宝安区福永街道龙王庙工业区) filed a patent application (PCT/CN2023/143437) for "PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, AND PREPARATION METHOD THEREFOR AND USE THEREOF" on Dec 29, 2023. With publication no. WO/2025/138168, the details related to the patent application was published on Jul 03, 2025.

Notably, the patent a...