INTERNATIONAL PATENT: SHANGHAI SEMICONDUCTOR WAFER TECHNOLOGY CO., LTD, 上海中欣晶圆半导体科技有限公司 FILES APPLICATION FOR "CASSETTE-FREE CLEANING METHOD FOR ULTRATHIN FZ SILICON WAFER"

GENEVA, Nov. 30 -- SHANGHAI SEMICONDUCTOR WAFER TECHNOLOGY CO., LTD (Building 1, No 181 Shanlian RoadBaoshan District, Shanghai 200444), 上海中欣晶圆半导体科技有限公司 (中国上海市宝山区山连路181号1幢) filed a patent application (PCT/CN2024/110878) for "CASSETTE-FREE CLEANING METHOD FOR ULTRATHIN FZ SILICON WAFER" on Aug 09, 2024. With publication no. WO/2025/241317, the details related to the patent application was published on Nov 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World...