INTERNATIONAL PATENT: SHANGHAI LEADING SEMICONDUCTOR TECHNOLOGY DEVELOPMENT CO, LTD., 上海致领半导体科技发展有限公司 FILES APPLICATION FOR "COOLING SYSTEM, POLISHING APPARATUS AND POLISHING SYSTEM FOR HEAVY-DUTY SILICON CARBIDE WAFER PROCESSING"

GENEVA, Sept. 28 -- SHANGHAI LEADING SEMICONDUCTOR TECHNOLOGY DEVELOPMENT CO, LTD. (377 Changtao Road, Changxing IslandChongming District, Shanghai 201913), 上海致领半导体科技发展有限公司 (中国上海市崇明区长兴岛长涛路377号) filed a patent application (PCT/CN2024/129888) for "COOLING SYSTEM, POLISHING APPARATUS AND POLISHING SYSTEM FOR HEAVY-DUTY SILICON CARBIDE WAFER PROCESSING" on Nov 05, 2024. With publication no. WO/2025/194791, the details related to the patent application was published on Sep 25, 2025.

Notably, the patent application was submitted under the ...