INTERNATIONAL PATENT: SHANGHAI INTEGRATED CIRCUIT EQUIPMENT ＆ MATERIALS INDUSTRY INNOVATION CENTER CO., LTD., 上海集成电路装备材料产业创新中心有限公司 FILES APPLICATION FOR "DIFFRACTION-BASED OVERLAY MARK"

GENEVA, Feb. 3 -- SHANGHAI INTEGRATED CIRCUIT EQUIPMENT ＆ MATERIALS INDUSTRY INNOVATION CENTER CO., LTD. (No. 497, Loulu Road,Jiading District, Shanghai 201807), 上海集成电路装备材料产业创新中心有限公司 (中国上海市嘉定区娄陆公路497号) filed a patent application (PCT/CN2024/106330) for "DIFFRACTION-BASED OVERLAY MARK" on Jul 19, 2024. With publication no. WO/2025/021014, the details related to the patent application was published on Jan 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (I...