INTERNATIONAL PATENT: SHANGHAI INSTITUTE OF IC MATERIALS, 上海集成电路材料研究院有限公司 FILES APPLICATION FOR "THIN FILM MANUFACTURING APPARATUS HAVING CARRIER GAS RECTIFICATION CHAMBER AND THIN FILM MANUFACTURING METHOD"

GENEVA, Sept. 19 -- SHANGHAI INSTITUTE OF IC MATERIALS (10F, Building 1, 333 Huangqing RoadJiading District, Shanghai 201899), 上海集成电路材料研究院有限公司 (中国上海市嘉定区皇庆路333号1号楼10F) filed a patent application (PCT/CN2024/096667) for "THIN FILM MANUFACTURING APPARATUS HAVING CARRIER GAS RECTIFICATION CHAMBER, AND THIN FILM MANUFACTURING METHOD" on May 31, 2024. With publication no. WO/2025/189571, the details related to the patent application was published on Sep 18, 2025.

Notably, the patent application was submitted under the International Patent Classif...