INTERNATIONAL PATENT: SHANGHAI INSTITUTE OF IC MATERIALS, 上海集成电路材料研究院有限公司 FILES APPLICATION FOR "ELECTRON BEAM DIRECT WRITING DEVICE AND ELECTRON BEAM DIRECT WRITING SYSTEM"

GENEVA, June 9 -- SHANGHAI INSTITUTE OF IC MATERIALS (10F, Building 1, 333 Huangqing RoadJiading District, Shanghai 201899), 上海集成电路材料研究院有限公司 (中国上海市嘉定区皇庆路333号1号楼10F) filed a patent application (PCT/CN2024/131432) for "ELECTRON BEAM DIRECT WRITING DEVICE AND ELECTRON BEAM DIRECT WRITING SYSTEM" on Nov 11, 2024. With publication no. WO/2025/113162, the details related to the patent application was published on Jun 05, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is manage...