INTERNATIONAL PATENT: SHANGHAI INSTITUTE OF IC MATERIALS, 上海集成电路材料研究院有限公司 FILES APPLICATION FOR "ELECTRON BEAM DIRECT WRITING DEVICE AND ELECTRON BEAM DIRECT WRITING METHOD"

GENEVA, June 9 -- SHANGHAI INSTITUTE OF IC MATERIALS (Room 301, 3rd Floor, Building 1, No. 1180, Xingxian RoadJiading District, Shanghai 201800), 上海集成电路材料研究院有限公司 (中国上海市嘉定区兴贤路1180号1幢3层301室) filed a patent application (PCT/CN2024/130490) for "ELECTRON BEAM DIRECT WRITING DEVICE AND ELECTRON BEAM DIRECT WRITING METHOD" on Nov 07, 2024. With publication no. WO/2025/113133, the details related to the patent application was published on Jun 05, 2025.

Notably, the patent application was submitted under the International Patent Classificatio...