INTERNATIONAL PATENT: SHANGHAI INSTITUTE OF IC MATERIALS, 上海集成电路材料研究院有限公司 FILES APPLICATION FOR "ELECTRODE STRUCTURE, BULK ACOUSTIC WAVE RESONATOR STRUCTURE, FILTER AND MANUFACTURING METHOD"

GENEVA, June 22 -- SHANGHAI INSTITUTE OF IC MATERIALS (10F, Building 1, 333 Huangqing RoadJiading District, Shanghai 200810), 上海集成电路材料研究院有限公司 (中国上海市嘉定区皇庆路333号1号楼10F) filed a patent application (PCT/CN2024/114068) for "ELECTRODE STRUCTURE, BULK ACOUSTIC WAVE RESONATOR STRUCTURE, FILTER AND MANUFACTURING METHOD" on Aug 22, 2024. With publication no. WO/2025/123770, the details related to the patent application was published on Jun 19, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) syste...