INTERNATIONAL PATENT: SEEYA OPTRONICS CO., LTD., 上海视涯技术有限公司 FILES APPLICATION FOR "MASK AND MANUFACTURING METHOD THEREFOR"

GENEVA, April 18 -- SEEYA OPTRONICS CO., LTD. (2F, Building 13, 27 Xinjinqiao Road, China (Shanghai) Pilot Free Trade ZonePudong New Area, Shanghai 201206), 上海视涯技术有限公司 (中国上海市浦东新区中国(上海)自由贸易试验区新金桥路27号13号楼2层) filed a patent application (PCT/CN2024/098316) for "MASK AND MANUFACTURING METHOD THEREFOR" on Jun 11, 2024. With publication no. WO/2025/077242, the details related to the patent application was published on Apr 17, 2025.

Notably, the patent application was submitted under th...