GENEVA, Nov. 10 -- RIKEN (2-1, Hirosawa, Wako-shi, Saitama3510198), 国立研究開発法人理化学研究所 (埼玉県和光市広沢２番１号) filed a patent application (PCT/JP2025/016170) for "METHOD FOR PRODUCING PLANT WITH REDUCED HARSHNESS" on Apr 28, 2025. With publication no. WO/2025/229945, the details related to the patent application was published on Nov 06, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): ABE, Hiroshi (c/o RIKEN, 2-1, Hirosawa, Wa...