INTERNATIONAL PATENT: RIKEN, 国立研究開発法人理化学研究所, KEIO UNIVERSITY, 慶應義塾 FILES APPLICATION FOR "METHOD AND KIT FOR PREDICTING EFFECTIVENESS OF DUPILUMAB ADMINISTRATION TO ATOPIC DERMATITIS PATIENT"

Posted On: 2025-12-01

GENEVA, Dec. 1 -- RIKEN (2-1, Hirosawa, Wako-shi, Saitama3510198), 国立研究開発法人理化学研究所 (埼玉県和光市広沢２番１号), KEIO UNIVERSITY (15-45, Mita 2-chome, Minato-ku, Tokyo1088345), 慶應義塾 (東京都港区三田二丁目１５番４５号) filed a patent application (PCT/JP2025/018537) for "METHOD AND KIT FOR PREDICTING EFFECTIVENESS OF DUPILUMAB ADMINISTRATION TO ATOPIC DERMATITIS PATIENT" on May 22, 2025. With publication no. WO/2025/244092, the details related to the patent ...

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INTERNATIONAL PATENT: RIKEN, 国立研究開発法人理化学研究所, KEIO UNIVERSITY, 慶應義塾 FILES APPLICATION FOR "METHOD AND KIT FOR PREDICTING EFFECTIVENESS OF DUPILUMAB ADMINISTRATION TO ATOPIC DERMATITIS PATIENT"