INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "SUBSTRATE MATERIAL FOR ANTENNA AND MANUFACTURING METHOD THEREOF"

GENEVA, Aug. 11 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都港区東新橋一丁目９番１号) filed a patent application (PCT/JP2024/003168) for "SUBSTRATE MATERIAL FOR ANTENNA AND MANUFACTURING METHOD THEREOF" on Jan 31, 2024. With publication no. WO/2025/163837, the details related to the patent application was published on Aug 07, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HATAKEYAMA Ari...