GENEVA, March 9 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都港区東新橋一丁目９番１号) filed a patent application (PCT/JP2023/030756) for "SLURRY AND POLISHING METHOD" on Aug 25, 2023. With publication no. WO/2025/046662, the details related to the patent application was published on Mar 06, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): MAEDA Masanori (c/o Resonac Corporation, 13-9, Shi...