GENEVA, March 25 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都港区東新橋一丁目９番１号) filed a patent application (PCT/JP2024/032400) for "POLISHING LIQUID AND POLISHING METHOD" on Sep 10, 2024. With publication no. WO/2025/057949, the details related to the patent application was published on Mar 20, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): IIKURA Daisuke (c/o Resonac Corporation...