INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD AND WIRING BOARD PRODUCTION METHOD"

GENEVA, Oct. 27 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都港区東新橋一丁目９番１号) filed a patent application (PCT/JP2024/015031) for "PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD, AND WIRING BOARD PRODUCTION METHOD" on Apr 15, 2024. With publication no. WO/2025/220085, the details related to the patent application was published on Oct 23, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO)....