GENEVA, Sept. 16 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都港区東新橋一丁目9番1号) filed a patent application (PCT/JP2024/008079) for "METHOD FOR PRODUCING FUNDAMENTAL RAW CHEMICAL MATERIAL AND APPARATUS FOR PRODUCING FUNDAMENTAL RAW CHEMICAL MATERIAL" on Mar 04, 2024. With publication no. WO/2025/186869, the details related to the patent application was published on Sep 11, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Prop...