INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "MAGNETIC COMPOSITION, MAGNETIC FILM, STACK AND CIRCUIT MEMBER"

GENEVA, June 3 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都港区東新橋一丁目９番１号) filed a patent application (PCT/JP2024/041149) for "MAGNETIC COMPOSITION, MAGNETIC FILM, STACK, AND CIRCUIT MEMBER" on Nov 20, 2024. With publication no. WO/2025/110185, the details related to the patent application was published on May 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): YONEKURA Motoki ...