INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "CLEANING COMPOSITION, CLEANING MATERIAL AND METHOD FOR CLEANING MOLD"

GENEVA, Feb. 3 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都港区東新橋一丁目９番１号) filed a patent application (PCT/JP2024/021422) for "CLEANING COMPOSITION, CLEANING MATERIAL, AND METHOD FOR CLEANING MOLD" on Jun 12, 2024. With publication no. WO/2025/022851, the details related to the patent application was published on Jan 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): UNOKI, Ke...