INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "ANTENNA SUBSTRATE MATERIAL AND MANUFACTURING METHOD THEREFOR"

GENEVA, Aug. 11 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都港区東新橋一丁目９番１号) filed a patent application (PCT/JP2024/038732) for "ANTENNA SUBSTRATE MATERIAL AND MANUFACTURING METHOD THEREFOR" on Oct 30, 2024. With publication no. WO/2025/164007, the details related to the patent application was published on Aug 07, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HATAKEYAMA Arisa ...