INTERNATIONAL PATENT: OSAKA GAS CHEMICALS CO., LTD., 大阪ガスケミカル株式会社 FILES APPLICATION FOR "FLUORENE COMPOUND, PRODUCTION METHOD THEREFOR AND USE THEREOF"

GENEVA, Oct. 5 -- OSAKA GAS CHEMICALS CO., LTD. (2-37, Chiyozaki 3-chome-minami, Nishi-ku, Osaka-shi, Osaka5500023), 大阪ガスケミカル株式会社 (大阪府大阪市西区千代崎三丁目南２番３７号) filed a patent application (PCT/JP2024/037676) for "FLUORENE COMPOUND, PRODUCTION METHOD THEREFOR, AND USE THEREOF" on Oct 23, 2024. With publication no. WO/2025/203802, the details related to the patent application was published on Oct 02, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by...