INTERNATIONAL PATENT: NUFLARE TECHNOLOGY, INC., 株式会社ニューフレアテクノロジー FILES APPLICATION FOR "METHOD FOR ADJUSTING DEFLECTION POSITION OF CHARGED PARTICLE BEAM DRAWING AND CHARGED PARTICLE BEAM DRAWING METHOD"

GENEVA, July 29 -- NUFLARE TECHNOLOGY, INC. (8-1, Shinsugita-cho, Isogo-ku, Yokohama-shi, Kanagawa2358522), 株式会社ニューフレアテクノロジー (神奈川県横浜市磯子区新杉田町８番１) filed a patent application (PCT/JP2024/035970) for "METHOD FOR ADJUSTING DEFLECTION POSITION OF CHARGED PARTICLE BEAM DRAWING, AND CHARGED PARTICLE BEAM DRAWING METHOD" on Oct 08, 2024. With publication no. WO/2025/154341, the details related to the patent application was published on Jul 24, 2025.

Notably, the patent application was submitted under the International Pat...