INTERNATIONAL PATENT: NUFLARE TECHNOLOGY, INC., 株式会社ニューフレアテクノロジー FILES APPLICATION FOR "ELECTRON BEAM LITHOGRAPHY DEVICE AND ELECTRON BEAM LITHOGRAPHY METHOD"

GENEVA, Dec. 1 -- NUFLARE TECHNOLOGY, INC. (8-1, Shinsugita-cho, Isogo-ku, Yokohama-shi, Kanagawa2358522), 株式会社ニューフレアテクノロジー (神奈川県横浜市磯子区新杉田町８番１) filed a patent application (PCT/JP2025/006000) for "ELECTRON BEAM LITHOGRAPHY DEVICE AND ELECTRON BEAM LITHOGRAPHY METHOD" on Feb 21, 2025. With publication no. WO/2025/243629, the details related to the patent application was published on Nov 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is manag...