GENEVA, Aug. 18 -- NISSAN CHEMICAL CORPORATION (5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo1036119), 日産化学株式会社 (東京都中央区日本橋二丁目５番１号) filed a patent application (PCT/JP2025/002359) for "RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM, RESIST PATTERN-FORMING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD" on Jan 27, 2025. With publication no. WO/2025/169768, the details related to the patent application was published on Aug 14, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by t...