GENEVA, Sept. 30 -- NISSAN CHEMICAL CORPORATION (5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo1036119), 日産化学株式会社 (東京都中央区日本橋二丁目５番１号) filed a patent application (PCT/JP2025/011033) for "RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE" on Mar 21, 2025. With publication no. WO/2025/198016, the details related to the patent application was published on Sep 25, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is man...